Kalrez®
O-Rings and Seals
Critical
Properties

* Copyright for photograph |
Kalrez®
perfluoroelastomer o-rings and seals last longer and seal more
effectively than other elastomers due to their exceptional chemical
resistance and thermal stability. Longer-lasting seals can be
a direct route to extended mean time between replacement and lower
cost of ownership.
Thermal
Stability
Even
after long-term exposure to temperatures up to 327°, Kalrez®
retains its elasticity and recovery properties better than other
high temperature elastomers.
It
resists hardening and embrittlement, the principal heat-related
cause of seal degradation and failure. And in high-vacuum applications,
Kalrez® exhibits negligible outgassing over a wide range of
temperatures. This helps reduce pump-down times and is a key requirement
in semiconductor manufacture and other applications where a contamination-free
environment is critical.
Exceptional
Chemical Resistance
Kalrez®
parts have virtually universal chemical resistance. They withstand
attack by more than 1,800 chemicals including solvents, amines
and plasmas. Kalrez® seals last longer than other elastomers
on the market.
Maintains
sealing force to keep seals tight
As
proven in ISO 334 tests, Kalrez® outperforms other elastomers
when it comes to sealing force retention, a measure of seal life.
Even under harsh and aggressive conditions, Kalrez® will retain
its sealing force longer in both short and long-term serivces.
And thanks to its true-rubber resiliency, Kalrez® prevents
leaks caused by creep, a major problem with PTFE and other plastic
materials.
Low
Compression Set
Long-Term
O-Ring Compression Set at 204ºC (400ºF)

As
shown above, Kalrez® parts exhibit low compression set, maintaining
their elastic recovery to maintain tight seals over the long haul.
Because Kalrez® parts recover better under compression than
other perfluoroelastomers, they maintain their shape better under
prolonged stress.
Next
topic: Comparison
Chart
Kalrez®
is a registered trademark of DuPont Performance Elastomers
*
© Photographer: NASA |